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Titel:
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First xSi cell results using selective emitters formed with diffusion barriers in one step
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Auteur(s):
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Gepubliceerd door:
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Publicatie datum:
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ECN
Zonne-energie
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1-6-2001
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ECN publicatienummer:
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Publicatie type:
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ECN-RX--01-034
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Conferentiebijdrage
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Aantal pagina's:
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Volledige tekst:
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2
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Download PDF
(212kB)
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Gepresenteerd op: 12th Photovoltaic Science and Engineering Conference, Jeju, Korea, 11-15 juni 2001.
Samenvatting:
A simple and robust selective emitter process is described which uses a selectivity screen-printed diffusion layer, deposited before phosphorus diffusion. The method enables an efficiency increase with more than 0.4% and is suitable for large scale production processes.
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