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Titel:
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Improved thermally stable surface and bulk passivation of PECVD SiNx:H using N2 and SiH4
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Auteur(s):
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Weeber, A.W.; Rieffe, H.C.; Goris, M.J.A.A.; Soppe, W.J.; Hong, J.; Kessels, W.M.M.; Sanden, M.C.M. van de
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Gepubliceerd door:
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Publicatie datum:
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ECN
Zonne-energie
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1-5-2003
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ECN publicatienummer:
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Publicatie type:
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ECN-RX--03-021
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Conferentiebijdrage
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Aantal pagina's:
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Volledige tekst:
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4
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Download PDF
(459kB)
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Gepresenteerd op: 3rd World Conference on Photovoltaic Energy Conversion, Osaka, Japan, 11-18 mei 2003.
Samenvatting:
Excellent and thermally stable surface passivation of SiNx:H grown usingN2 and SiH4 as precursor gases has been obtained with MicroWave PECVD.
The thermal stability of the surface passivation is even better than
that for layers deposited with NH3 and SiH4. Additionally, we found
that the bulk passivating properties of SiNx:H deposited with N2?
are as good as that of the standard SiNx:H deposited with NH3?.
Absorption at shorter wavelengths in SiNx:H layers deposited with N2?
is somewhat higher. Solar cell efficiencies are comparable for both
nitrides.
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