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Titel:
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Wet chemical etching for crystalline silicon solar cells
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Auteur(s):
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Gepubliceerd door:
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Publicatie datum:
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ECN
Zonne-energie
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19-6-2006
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ECN publicatienummer:
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Publicatie type:
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ECN-RX--06-064
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Conferentiebijdrage
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Aantal pagina's:
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Volledige tekst:
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4
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Download PDF
(376kB)
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Gepresenteerd op: 5th International Workshop on Physical Chemistry of Wet Etching of Semiconductors PCWECS, Saarbrücken, Germany, 19-21 juni 2006.
Samenvatting:
Alkaline etching is frequently used in the processing of silicon into solar cells. High temperatures (above 100°C) and concentrations (> 10 M) of typically NaOH or KOH solutions are used for the fast removal of saw-damage for the wafers as-cut from the ingot. At low concentrations (less than 10 M)
and temperatures (< 100°C) these solutions are used particularly on monocrystalline (100) oriented silicon wafers for the formation pyramidal etch structures having excellent anti-reflective properties.
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