ECN publicatie:
Silicon solar cells textured by reactive ion etching with natural lithography
Gepubliceerd door: Publicatie datum:
ECN Zonne-energie 1-5-2000
ECN publicatienummer: Publicatie type:
ECN-RX--00-012 Conferentiebijdrage
Aantal pagina's: Volledige tekst:
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Gepresenteerd op: 16th European Photovoltaic Solar Energy Conference and Exhibition, Glasgow, Scotland, 1-5 mei 2000.

Several groups have demonstrated that Reactive Ion Etching (RIE) cantexture multi- crystalline silicon very well. Moreover RIE texturing can be integrated quite easily into existing process sequences. Whether this can be done cost effectively is still uncertain. In this work we apply RIE etching after deposition of a mask. The mask is a well defined microscopic mask that is created by self-organised processes. The mask geometry and etch conditions can be varied to create different kinds of periodic textures. Using these techniques we achieved a reproducible and homogeneous RIE texture on full size multi-crystalline silicon wafers. We achieved a .24% absolute efficiency gain by RIE over non- textured cells. RIE textured cells with an efficiency of 14.8% were made using an industrial type process sequence. 16 refs.

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