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Titel:
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Copper deposition on Pd membranes by electroless plating
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Auteur(s):
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Aacha, E.; Delft, Y.C. van; Overbeek, J.P.; Arias, P.L.; Cambra, J.F.
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Gepubliceerd door:
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Publicatie datum:
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ECN
Efficiency & Infrastructure
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16-9-2011
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ECN publicatienummer:
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Publicatie type:
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ECN-W--11-038
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Artikel wetenschap tijdschrift
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Aantal pagina's:
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10
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Gepubliceerd in: International Journal of Hydrogen Energy (Elsevier), , 2011, Vol.36, p.13114-13121.
Samenvatting:
PdCu membranes were prepared by the electroless plating of Pd membranes prepared on ceramic tubular supports. Different PdCu membranes were prepared with Pd content between 45 and 77 wt% and a total metal layer between 0.5 and 1.9 mm thickness. The alloying step was performed in two ways to compare and establish the required alloying time for obtaining high permeance membranes. The alloying was analysed with EDX composition measurements, and full alloying was not required to obtain a stable hydrogen flux. Finally, permeance tests were performed at different pressures, including temperature cycles in hydrogen and nitrogen, to observe membrane stability. The hydrogen permeance values of the membranes were high, between 1.5 x 10¯³ and 4.5 x 10¯³ mol/
(s Pa0.5 m²) at 673 K. The membranes recorded stable permeance values even after thermal cycles in a hydrogen atmosphere. Metal layer thickness was calculated using both the weight difference method and SEM images. SEM images were also used to analyse the surface morphology of the membranes, which was generally fairly uniform and smooth.
Copyright © 2011, Hydrogen Energy Publications, LLC. Published by Elsevier Ltd. All rights
reserved.
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