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Titel:
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Carbon footprint of PECVD chamber cleaning
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Auteur(s):
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Gepubliceerd door:
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Publicatie datum:
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ECN
Zonne-energie
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28-11-2008
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ECN publicatienummer:
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Publicatie type:
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ECN-W--08-063
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Artikel wetenschap tijdschrift
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Aantal pagina's:
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6
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Gepubliceerd in: Photovoltaics International (PV-Tech), , 2008, Vol.2, p.64-69.
Samenvatting:
The use of perfluorinated gases such as NF3, CF4 or SF6 for PECVD (plasma enhanced chemical vapor deposition) chamber cleaning has a much higher impact on global warming than does the use of onsite-generated F2. This holds true even when supposing that in the future much more effort is paid for the correct abatement and a leak-free supply and take-back chain. This paper will discuss the steps available to the PV industry for control and reduction of carbon emissions in the chamber cleaning process.
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