ECN publicatie:
First xSi cell results using selective emitters formed with diffusion barriers in one step
Gepubliceerd door: Publicatie datum:
ECN Zonne-energie 1-6-2001
ECN publicatienummer: Publicatie type:
ECN-RX--01-034 Conferentiebijdrage
Aantal pagina's: Volledige tekst:
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Gepresenteerd op: 12th Photovoltaic Science and Engineering Conference, Jeju, Korea, 11-15 juni 2001.

A simple and robust selective emitter process is described which uses a selectivity screen-printed diffusion layer, deposited before phosphorus diffusion. The method enables an efficiency increase with more than 0.4% and is suitable for large scale production processes.

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